Everyone wants to be better, regardless of what they do – something that is especially true for aspiring artists.
These people spend countless hours and go through sleepless nights all for the sake of improving their craft. However, what they don’t know is this: it only takes a couple of seconds to lose years of hard work. If this happens, will they be ready?
This Saturday, they can be.
A.R.E. You? is an forum that aims to concretize what artist rights really are. For months, the people behind the event conceptualized a program that would equip aspiring artists with basic knowledge on IP Law the most effective way possible. Here, artists will be taken in a step-by-step journey on preventing art theft and upholding one’s rights.
The forum will be held on May 27, 2017 at the Computational Science Research Center from 9 AM – 3 PM. Featured speakers include lawyers Marnie Tonson, Elgene Feliciano, and Angela Santiago. Some of the topics that will be discussed are IP Law and Copyright, Threats and Challenges in the Industry, Plagiarism and Art Theft, Personal Finance, among others.
Take your first step in a journey to become a better artist! RSVP at tinyurl.com/AREYouRSVPForm
